منابع مشابه
Limitations of Constitutive Relations for TiNi Shape Memory Alloys
Phase transformation tensor Q in the constitutive equation pmposed by Tanaka has been evaluated by employing experimental data of TiNi alloys in a constrained recovery process. It demonstrates that the absolute value of Q for the consmined recovery process is typically about 0.6 0.7 x103 MPa, which is much smaller than that for the stress induced martensitic transformation (typically 2.5 3.5 x1...
متن کاملDeformation Properties of TiNi Shape Memory Alloy
In order to describe the deformation properties due to the martensitic transformation and the R-phase transformation of TiNi shape memory alloy, a thermomechanical constitutive equation considering the volume fractions of induced phases associated with both transformations is developed. The proposed constitutive equation expresses well the properties of the shape memory effect, pseudoelasticity...
متن کاملThermomechanical Properties of TiNi Shape Memory Alloy
The thermomechanical properties of shape memory effect and superelasticity due to the martensitic transformation and the R-phase transformation of TiNi shape memory alloy were investigated experimentally. The transformation line, recovery stress and fatigue property due to both transformations were discussed for cyclic deformation. The thermomechanical properties due to the R-phase transformati...
متن کاملLaser-Welding of a Ni-Rich TiNi Shape Memory Alloy : Mechanical Behavior
A Nd:YAG laser was used for joining a pseudoelastic Ti-51.5 at.% Ni shape memory alloy. Tensile tests on sheet metal of 0.5 mm thickness were performed at temperatures of -40°C, +20°C and 1 10°C, representing the martensitic, pseudoelastic and austenitic condition, respectively. Laser-welded specimens exhibited an ultimate tensile strength of about 820 MPa not affected by the test tempefature. ...
متن کاملTiNi shape memory alloys for MEMS : thin film deposition , thermophysical properties and laser micromachining characteristics
The growth of TiNi thin films by ion beam sputter deposition using a Kaufmann type ion source is described. Argon ions are used to sputter separate Ti and Ni targets to deposit nearequiatomic TiNi thin films. Typically, ion energies and current densities of 1500 eV and 1 mA cm respectively are used, with an argon overpressure of around 0.05 mtorr, to achieve deposition rates of order 1 μm hr. T...
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ژورنال
عنوان ژورنال: Bulletin of the Japan Institute of Metals
سال: 1985
ISSN: 0021-4426,1884-5835
DOI: 10.2320/materia1962.24.56